Course details

This subject provides fundamentals of complementary metal-oxide-semiconductor (CMOS) processes and process integration. It covers the principles of various wafer fabrication processes, the causes of various fabrication-related integrated circuit (IC) defects, the working principles of fabrication equipment, as well as CMOS process integration.

Objectives

The subject aims to equip students with knowledge and skills to:  

  • explain the fundamental principles of various wafer fabrication processes.
  • simulate and run various wafer fabrication processes.
  • produce process sequences used for CMOS IC process integration.
Updated on 30 August, 2016

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